Name: 8/6/4/2인치 LPCVD 산화 오븐 완전 자동화 저산소 제어 얇은 필름 퇴적
Uploaded: 2026-03-10CDT00:13:12-05:00
Duration: 46 s
Description: Discover the 8/6/4/2Inch LPCVD Oxidation Furnace, a fully automated system for thin film deposition with low oxygen control. Ideal for semiconductor manufacturing, it ensures excellent film uniformity and repeatability, supporting various oxidation, annealing, and LPCVD processes. Perfect for high-volume production with seamless MES integration.

잡담 저희에게 연락하십시오

8/6/4/2인치 LPCVD 산화 오븐 완전 자동화 저산소 제어 얇은 필름 퇴적

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April 27, 2025

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Discover the 8/6/4/2Inch LPCVD Oxidation Furnace, a fully automated system for thin film deposition with low oxygen control. Ideal for semiconductor manufacturing, it ensures excellent film uniformity and repeatability, supporting various oxidation, annealing, and LPCVD processes. Perfect for high-volume production with seamless MES integration.