개요: 이 워크스루에서는 주요 설계 아이디어와 성능으로의 변환 방식을 강조합니다. 마이크로유체 레이저 장비가 반도체 웨이퍼 가공을 위해 머리카락 굵기의 물줄기를 사용하여 레이저 에너지를 안내하는 방식을 살펴보세요. 이 하이브리드 마이크로머시닝 방법이 SiC 및 GaN 웨이퍼와 같은 단단하고 깨지기 쉬운 재료에서 열 손상을 줄이고 오염을 방지하며 가장자리 품질을 향상시키는 방법을 알아보세요.
관련 제품 특징:
Hybrid micromachining method coupling a thin water jet with a laser beam for precise energy delivery.
Total internal reflection guiding mechanism ensures accurate laser beam transmission to the workpiece.
Continuous cooling and debris removal during processing for a cleaner, more stable operation.
Reduces heat-affected damage, contamination, oxidation, and microcracks in semiconductor materials.
Supports various laser wavelengths (1064 nm, 532 nm, 355 nm) and power levels up to 200 W.
Configurable nozzle diameters from 30-150 μm using sapphire or diamond materials.
High-precision positioning with accuracy up to ±5 μm and repeatability of ±2 μm.
Applicable to advanced packaging, wafer dicing, chip drilling, and defect repair processes.
자주 묻는 질문:
What is microjet laser technology?
Microjet laser technology is a hybrid micromachining process where a thin, high-velocity water jet guides a laser beam using total internal reflection, delivering precise energy to the workpiece while providing continuous cooling and debris removal.
What are the key advantages of microjet laser processing versus dry laser processing?
Key advantages include reduced heat-affected damage, less contamination and redeposition, lower risk of oxidation and microcracks, minimized kerf taper, and improved edge quality on hard and brittle semiconductor materials.
Which semiconductor materials are best suited for microjet laser processing?
It is particularly well-suited for hard and brittle materials like silicon carbide (SiC) and gallium nitride (GaN), as well as silicon wafers, ultra-wide-bandgap materials such as diamond and gallium oxide, and selected advanced ceramic substrates.